Checking date: 22/04/2018

Course: 2020/2021

Plasma Technology Applied to Industy
Study: European Master in Nuclear Fusion Science and Engineering Physic (273)

Coordinating teacher:

Department assigned to the subject: Department of Physics

Type: Electives
ECTS Credits: 3.0 ECTS


Students are expected to have completed
Basic knowledge of plasma kinetics, atomic physics, fluid mechanics and particle- material interaction.
Competences and skills that will be acquired and learning results.
The course intends to show the students that the plasma is reactive medium which can be applied to various sectors of the productive fabric, assisting in solving some of the problems that come up in industry and no just for basic physics studies. The course includes a description of different types of plasmas (ICP, glow discharges, microwave plasmas┬┐) and their applications to surface treatment, synthesis and chemical analysis of samples, sterilization by plasmas. The course will provide the student with appropriate knowledge about the some practice applications of the plasmas to the industrial sector.
Description of contents: programme
1. Laboratory and industrial plasmas 2. Synthesis of materials: thin film growth by plasma assisted techniques 3. Inductively Coupled Plasmas (ICP) 4. Plasma surface treatment 5. Plasmas produced by a surface wave 6. Other plasma applications 7. Transfer of results from the laboratory to business.
Learning activities and methodology
* Teaching Methods: Classroom lectures and short practical course on synthesis of materials (thin films). * Course Material: Transparencies about the program contents. The students will have this material before each session in order to facilitate their attention in class and their active participation.
Assessment System
  • % end-of-term-examination 50
  • % of continuous assessment (assigments, laboratory, practicals...) 50
Basic Bibliography
  • Edited by Mario Capitelli and Claudine Gorse. PLASMA TECHNOLOGY: FUNDAMENTALS AND APPLICATIONS. Plenum New York. 1992
  • M.A. Lieberman and A.J. Lichtenberg. PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING. John Wiley & Sons, Inc. New York. 1994
Additional Bibliography
  • Edited by Akbar Montaser and D.W. Golightly. INDUCTIVELY COUPLED PLASMAS IN ANALYTICAL ATOMIC SPECTROSCOPIC. VCH Publishers. 1987
  • Edited by Carlos M. Ferreira and Michel Moisan. MICROWAVE DISCHARGES: FUNDAMENTAL AND APPLICATIONS. (Nato ASI Series), Serie B:302, Plenum. 1993
  • Edited by H. Schlüter and A. Shivarova. ADVANCED TECHNOLOGIES BASED ON WAVE AND BEAM-GENERATED PLASMAS. Kluwer Academic Publishers. 1999
  • Edited by J.L.Voseen and W.Kern. THIN FILM PROCESSES. Academic Press, New York. 1978
  • Hugh O. Pierson. HANDBOOK OF CHEMICAL VAPOR DEPOSITION. Principles, Technology and Applications. Noyes Publications, New Jersey. 1992

The course syllabus and the academic weekly planning may change due academic events or other reasons.